| 摘要 |
PROBLEM TO BE SOLVED: To decrease noise in a transmitted light quantity caused by interference of light on a substrate and to control the film thickness with high accuracy. SOLUTION: A carousel type sputtering apparatus which gives preferable uniformity in the film thickness without autorotation of a substrate during film formation is used, as well as a substrate 18 having the back face 18B inclined at a predetermined angle with respect to the film formation face 18A of the substrate is used. The inclination angleθof the back face 18B with respect to the film formation face 18A is preferably in a range of 0°<θ≤2°. The substrate is fixed so that the thickest part or the thinnest part of the substrate 18 is aligned in the vertical direction of a substrate holder. The optical axis is preferably adjusted in such a manner that the light outputted from a projecting unit is perpendicular to the film formation surface 18A on the film formation surface 18A. COPYRIGHT: (C)2006,JPO&NCIPI
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