发明名称 |
FILM-FORMING METHOD, MANUFACTURING METHOD OF DISPLAY DEVICE, DISPLAY DEVICE, AND ELECTRONIC EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming method or the like by which film-forming can be carried out easily and uniformly in forming a thin film by a plasma film-forming method. SOLUTION: In the film-forming method in which a mask 130 having an arbitrary pattern is arranged on a base board 10, and in which the thin film 40 is formed by adhering fluorocarbon onto the base board 10 by a plasma chemical vapor deposition method, the mask 130 formed by a weak magnetic material is used. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006004740(A) |
申请公布日期 |
2006.01.05 |
申请号 |
JP20040179593 |
申请日期 |
2004.06.17 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HOSODA TOSHIKO;YOTSUYA SHINICHI |
分类号 |
H05B33/10;C23C16/04;C23C16/32;C23C16/50;H01L51/50 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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