发明名称 FILM-FORMING METHOD, MANUFACTURING METHOD OF DISPLAY DEVICE, DISPLAY DEVICE, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a film-forming method or the like by which film-forming can be carried out easily and uniformly in forming a thin film by a plasma film-forming method. SOLUTION: In the film-forming method in which a mask 130 having an arbitrary pattern is arranged on a base board 10, and in which the thin film 40 is formed by adhering fluorocarbon onto the base board 10 by a plasma chemical vapor deposition method, the mask 130 formed by a weak magnetic material is used. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006004740(A) 申请公布日期 2006.01.05
申请号 JP20040179593 申请日期 2004.06.17
申请人 SEIKO EPSON CORP 发明人 HOSODA TOSHIKO;YOTSUYA SHINICHI
分类号 H05B33/10;C23C16/04;C23C16/32;C23C16/50;H01L51/50 主分类号 H05B33/10
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