| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer compound which is used as a base resin for resist materials, particularly chemical amplification type positive resist materials, gives high sensitivity, resolution, and resistance to dry etching, excels in the adhesion to a substrate, and can give such a resist pattern as to prevent the pattern side walls from roughening. <P>SOLUTION: The polymer compound comprises at least one of the respective repeating units to be represented by formulae (1) and (2) [wherein R<SP>1</SP>and R<SP>3</SP>are each H or CH<SB>3</SB>; R<SP>4</SP>is an alkylene group; R<SP>2</SP>is a substituent having a lactone structure selected from formulae (R<SP>2</SP>-1) to (R<SP>2</SP>-4) (wherein Y is CH<SB>2</SB>or O and when Y is CH<SB>2</SB>, R<SP>5</SP>is CO<SB>2</SB>R<SP>7</SP>, and when Y is O, R<SP>5</SP>is H or CO<SB>2</SB>R<SP>7</SP>; R<SP>6</SP>is H or an alkyl group; and R<SP>7</SP>is an alkyl group or a group in which oxygen is inserted between the carbon-carbon bond of the alkyl group)] and has a weight average molecular weight of 1,000-50,000. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
