发明名称 METHOD FOR MANUFACTURING OPTICAL ELEMENT ARRAY AND MASK FOR LITHOGRAPHY
摘要 <p><P>PROBLEM TO BE SOLVED: To easily form an actual feature more similar to a designed feature. <P>SOLUTION: For example, in a method for manufacturing a microlens array having a plurality of microlenses to be used for a liquid crystal projector, a microlens array with fidelity to a designed feature is manufactured by using a gray scale mask 30 for lithography which has a plurality of correction portions 32 to form an enhancing feature (protruding features) on the borders of the plurality of microlenses and by gray scale lithography techniques and etching techniques. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2005352142(A) 申请公布日期 2005.12.22
申请号 JP20040172540 申请日期 2004.06.10
申请人 SEIKO EPSON CORP 发明人 UCHIKAWA DAISUKE
分类号 G02B3/00;G03F1/00;G03F1/68;(IPC1-7):G03F1/08 主分类号 G02B3/00
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