Method for fabricating CMOS image sensor with improved photo sensitivity,申请号KR19990025930-传众专利搜索

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发明名称	Method for fabricating CMOS image sensor with improved photo sensitivity
摘要
申请公布号	KR100538068(B1)	申请公布日期	2005.12.20
申请号	KR19990025930	申请日期	1999.06.30
申请人		发明人
分类号	H01L31/10;(IPC1-7):H01L31/10	主分类号	H01L31/10
代理机构		代理人
主权项
地址

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