发明名称 DETOXIFICATION APPARATUS AND DETOXIFICATION METHOD FOR WASTE GAS AND SYSTEM FOR FABRICATING ELECTRONIC DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a detoxification apparatus and a detoxification method for a waste gas in which fluorine concentration of a washing solution used for washing the waste gas is precisely detected, and provide a system for fabricating an electronic device. <P>SOLUTION: The detoxification apparatus is used for a waste gas containing PFC (perfluorocarbon) gas which is suspected to be a cause of global warming, and comprises a second scrubber 22 for washing a waste gas discharged out of a semiconductor treatment apparatus 90 and thermally decomposed by a reaction cylinder 30 with water, or the like, and a fluorine densitometer 60 for measuring the fluorine concentration of water used for washing treatment of the waste gas by the second scrubber 22. The fluorine concentration of water used for the washing treatment of the waste gas can precisely be detected and the fluorine concentration in the water to be discharged out the detoxification apparatus can be prevented from exceeding a prescribed discharge standard. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2005334755(A) 申请公布日期 2005.12.08
申请号 JP20040156308 申请日期 2004.05.26
申请人 SEIKO EPSON CORP 发明人 WATANABE KATSUO
分类号 B01D53/70;B01D53/68;B01D53/77;C02F1/00;H01L21/205;H01L21/3065;(IPC1-7):B01D53/70;H01L21/306 主分类号 B01D53/70
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