发明名称 |
WATER SOLUBLE RESIN COMPOSITION, METHOD OF PATTERN FORMATION AND METHOD OF INSPECTING RESIST PATTERN |
摘要 |
<p>A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The water-soluble resin composition is applied on a highly water-repellant resist pattern 3 formed by a resist such as an ArF-responsive radiation sensitive resin composition on a substrate 1 to form a coated layer 4 thereon. The resist pattern 3 and the coated layer 4 are heat-treated to form a developer-insoluble modified coated layer 5 in the vicinity of a surface of the resist pattern 3. The coated layer is developed and the resist pattern thickened by the modified layer 5 is formed. The modified layer is a layer with sufficient thickness and is able to be formed with a high dimensional controllability in a highly water-repellant resist pattern such as ArF-responsive radiation sensitive resin composition. As a result, a separation size and a hole aperture size of the resist pattern are reduced effectively to less than a limit resolution. As the modified layer 5 has a function of a protecting film for the resist pattern upon electron beam irradiation, a size measurement fluctuation of a resist pattern upon electron beam irradiation by a size measuring SEM can be prevented. <IMAGE></p> |
申请公布号 |
EP1602983(A1) |
申请公布日期 |
2005.12.07 |
申请号 |
EP20040711490 |
申请日期 |
2004.02.16 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP.;AZ ELECTRONIC MATERIALS (JAPAN) K.K. |
发明人 |
TAKANO, YUSUKE;HONG, SUNG-EUN |
分类号 |
G03F7/033;C08L39/00;G03F7/40;H01L21/027;(IPC1-7):G03F7/40 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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