发明名称 THIN-FILM FIELD EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a thin-film field effect transistor (TFT) which has carrier mobility higher than a conventional one and minimizes defects, and also to provide a method of manufacturing the thin-film field effect transistor. SOLUTION: There is provided the thin-film field effect transistor with metal/insulator/semiconductor structures, with an insulating layer being formed by a cyanoethylated dihydroxypropyl pulluran. By using the cyanoethylated dihydroxypropyl pulluran as an insulating material of the TFT, manufacturing cost is reduced by decreasing a probability of the TFT defects, without performing treatments, such as patternizing and etching or the like by means of photoresist or the like in circuit forming technology in use of former metal semiconductors and insulators. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005317936(A) 申请公布日期 2005.11.10
申请号 JP20050085603 申请日期 2005.03.24
申请人 SHIN ETSU CHEM CO LTD 发明人 FUKUI IKUO
分类号 H01L51/05;H01L29/786;H01L51/00;(IPC1-7):H01L29/786 主分类号 H01L51/05
代理机构 代理人
主权项
地址