发明名称 Mechanical oscillator for wafer scan with spot beam
摘要 The present invention is directed to a scanning apparatus and method for processing a substrate, wherein the scanning apparatus comprises a first link and a second link rigidly coupled to one another at a first joint, wherein the first link and second link are rotatably coupled to a base portion by the first joint, therein defining a first axis. An end effector, whereon the substrate resides, is coupled to the first link. The second link is coupled to a first actuator via at least second joint. The first actuator is operable to translate the second joint with respect to the base portion, therein rotating the first and second links about the first axis and translating the substrate along a first scan path in an oscillatory manner. A controller is further operable to maintain a generally constant translational velocity of the end effector within a predetermined scanning range.
申请公布号 US2005247891(A1) 申请公布日期 2005.11.10
申请号 US20040840186 申请日期 2004.05.06
申请人 ASDIGHA MEHRAN;CLEVELAND KURT D;KRISHNASAMY JAY;OTA KAN 发明人 ASDIGHA MEHRAN;CLEVELAND KURT D.;KRISHNASAMY JAY;OTA KAN
分类号 H01L21/00;H01L21/687;(IPC1-7):H01J37/20 主分类号 H01L21/00
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