发明名称 QUARTZ CRUCIBLE
摘要 <p><P>PROBLEM TO BE SOLVED: To prevent exfoliation of crystal chips from the inner surface of a quartz crucible during use in order to improve the yield of a silicon single crystal. <P>SOLUTION: The number of brown marks causing exfoliation is reduced by forming a layer, which is highly reactive with a silicon melt in comparison with its inner layer, within a layer of 150μm from the surface of the quartz crucible so as to make the erosion speed higher than the formation speed of a crystal nucleus. Concretely, the inner surface layer highly reactive with the silicon melt is formed from synthetic quartz glass or natural quartz glass containing alkali metals such as lithium, sodium or potassium and alkaline earth metals such as beryllium, magnesium, calcium, strontium or barium in an amount of≤100 ppm. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2005306708(A) 申请公布日期 2005.11.04
申请号 JP20040244479 申请日期 2004.08.24
申请人 KURAMOTO SEISAKUSHO CO LTD 发明人 WATABE HIROYUKI;SANPEI KEIKO;HASHIMOTO HISAHIDE;KO CHIKAAKI;UDA SATOSHI
分类号 C03B20/00;C30B15/10;C30B29/06;(IPC1-7):C30B29/06 主分类号 C03B20/00
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