METHODS FOR PRODUCING RUTHENIUM FILM AND RUTHENIUM OXIDE FILM

摘要

To provide a method that can relatively rapidly deposit a ruthenium film or ruthenium oxide that adheres well to substrate and that also does not incorporate impurities. Method for producing ruthenium film, characterized by reacting a gaseous volatile inorganic ruthenium compound with a gaseous reducing agent by introducing the gaseous volatile inorganic ruthenium compound and gaseous reducing agent into a reaction chamber (11) that holds at least one substrate and thereby depositing ruthenium on the at least one substrate. A further process involves decomposing a volatile ruthenium oxide, typically Ru04, to form a ruthenium oxide layer.