PHOTOSENSITIVE COMPOSITION FOR BLACK MATRIX

摘要

The invention provides a photosensitive composition for a black matrix, comprising binder resin (A) which contains a urethane acrylate compound produced by reaction between an isocyanate compound (a-1) represented by formula (1) and a polyhydroxy compound (a-2), CH2=CH-COO-R-NCO (1), (wherein R represents a hydrocarbon group having 1 to 30 carbon atoms), black-base pigment (B). The composition may further comprise ethylenic unsaturated monomer (C), photopolymerization initiator (D) and organic solvent (E). The mass contents of the components other than organic solvent (E) is 10-40 % for binder resin (A), 25-60 % for black-base pigment (B), 5-20 % for ethylenic unsaturated monomer and 2-25 % for photopolymerization initiator (D). By using the composition, a pattern having a thin film property and a high light-shielding property can be easily formed by a photolithography method, and the composition has sufficient sensitivity, resolution, developability, durability and curing speed.