| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide the polishing end detection device of a chemical mechanical polishing device capable of accurately detecting a polishing end. <P>SOLUTION: Measuring light 12 is emanated from a light source 7 having an inclination corresponding to a Brewster angle (determined by refractive indices of a film to be polished exposed to the surface of a wafer 3 and of polishing slurry) with respect to the normal line of the surface of the wafer 3. Reflected light from the surface of the wafer 3 is passed through a polarizing plate 15 having a polarization axis disposed to remove an s polarization wave of the reflected light, and is incident on a light receiving unit 8 for photoelectric conversion. With the constitution, when a film having a different refractive index from the film to be polished is exposed, the Brewster condition is not satisfied so that a reflected wave from the wafer 3 does not include a p polarization wave. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
