| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for coating an inner wall of a pore with a small inside diameter in a substrate or the surface of the substrate with a complicated shape with an amorphous film by using high-density plasma, and to provide an apparatus therefor. <P>SOLUTION: This surface-coating method comprises coating the substrate through generating the stable plasma converged at high density with an amorphous film by making a magnetic field work directly in a coating treatment chamber, further applying a pulse biasing voltage to the substrate, and then inducing the plasma of high density onto the inner wall of the pore with the small inside diameter in the substrate or the surface of the substrate with the complicated shape, which has been difficult to be coated. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
