| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coloring photosensitive resin composition, capable of forming a minute pattern superior in resolution, without performing silane coupling treatment on a base material applied by the coloring photosensitive resin composition, and to provide a photomask production material manufacturing a photomask superior in resolution, the photomask and its manufacturing method. <P>SOLUTION: The coloring photosensitive resin composition contains (i) a crosslinking alkali soluble resin binder, (ii) a monomer or an oligomer, having at least one polymerizing unsaturated coupling, (iii) a photo initiator having photosensiveness on light of long wavelength region of 405 nm or longer, (iv) a coloring material, and (v) a silane coupling agent. The photomask production material provides a light-shielding layer forming layer, formed by using the coloring photosensitive resin composition on a base material of light transmission. In the method of manufacturing the photomask, the photomask or the light-shielding layer, forming a layer of the photomask production material forming the light-shielding layer, is exposed in order to expose and develop the light-shielding layer forming layer of the photomask production material, thereafter, it is developed to form the light-shielding layer. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
