RAW MATERIAL SOLUTION DISCHARGE DEVICE, VAPORIZER FOR CVD, SOLUTION VAPORIZING CVD DEVICE, FLOW CONTROL METHOD, AND THIN FILM FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To enable the precise control of the amount of a flow of a raw material solution for CVD.

SOLUTION: A raw material solution discharge device comprises a raw material solution accommodation chamber for accommodating the raw material solution for CVD; a nozzle hole 11a which is formed in the wall member of the raw material solution accommodation chamber, and through which the raw material solution is discharged; a pressure unit 12a for pressing the raw material solution accommodated in the raw material solution accommodation chamber 11 based on an input signal, and for discharging the raw material solution from the nozzle hole 11a; and a control unit for controlling the transmission of a signal to control the amount of the raw material solution discharged from the nozzle hole 11a.

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