| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide plasma processing equipment having a built-in porous plate for uniforming the plasma distribution near a substrate to be treated while suppressing a reduction in plasma density, easily not by a try-and-error method. <P>SOLUTION: In the plasma processing equipment having the porous plate 4 installed between a plasma generator 8 and 7 and the substrate 2 to be treated, the shape and arrangement of pores of the porous plate is determined from the calculation of active species distribution and diffusion in the plasma generator, so that the plasma active species may have a desired density and distribution near the substrate. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
