发明名称 INSTALLATION FOR THE VACUUM TREATMENT OF SUBSTRATES.
摘要 <p>Disclosed is an installation which is characterized by the fact that it comprises several independent and aligned modules (M). Each of said modules (M) is provided with a vacuum treatment chamber (C) and a transfer chamber (B) with means for transferring a substrate within one of the different chambers or from one chamber to another, the second chamber being located downstream or upstream from, directly next to, or separated by at least one module from the first chamber, such that a substrate can be transferred into one chamber in order to undergo a treatment while another substrate is placed in a different chamber for a specific treatment.</p>
申请公布号 MXPA05001279(A) 申请公布日期 2005.09.08
申请号 MX2005PA01279 申请日期 2003.07.23
申请人 TECMACHINE 发明人 POIRSON, JEAN-MARC
分类号 C23C14/56;H01L21/00;H01L21/677 主分类号 C23C14/56
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