AN APPARATUS FOR PLASMA TREATMENT

摘要

The present invention provides an apparatus (10) for plasma treatment of a substrate surface (16). The apparatus comprises a plasma source (12) for generating a plasma and a plasma-control electrode (14). The apparatus further comprises a drive means for effecting a relative movement between the plasma-control electrode (14) and the plasma source (12) or of the plasma-control electrode (14) and the plasma source (12) relative to the substrate (16). The plasma-control electrode (14) is located adjacent the substrate (16) to facilitate treatment of the substrate surface (16) in a controlled manner.