发明名称 |
VISIBLE LIGHT-RESPONSIVE TITANIUM DIOXIDE PHOTOCATALYST THIN FILM AND MANUFACTURING METHOD THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for depositing a sulfur-added titanium dioxide film which is a very thin film having around several hundred nanometers thickness and exhibits a photocatalytic property in visible light. SOLUTION: The visible light-responsive titanium dioxide photocatalyst thin film is manufactured by using a target material prepared by firing titanium disulfide (TiS<SB>2</SB>) and adding sulfur to the target material as an impurity by a laser vapor deposition method. The target material is prepared by firing compression-molded titanium disulfide in the air of 350-450°C. The temperature of a substrate on which the visible light-responsive titanium dioxide photocatalyst thin film is deposited is controlled to be 350-450°C and sulfur is deposited in vacuum. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005218957(A) |
申请公布日期 |
2005.08.18 |
申请号 |
JP20040029331 |
申请日期 |
2004.02.05 |
申请人 |
JAPAN ATOM ENERGY RES INST |
发明人 |
YAMAMOTO HARUYA;SAI EIKI;UMEBAYASHI TSUTOMU;YOSHIKAWA MASATO |
分类号 |
C01G23/00;B01J27/02;B01J35/02;B01J37/02;C01G23/04;C23C14/08;C23C14/34;(IPC1-7):B01J35/02 |
主分类号 |
C01G23/00 |
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