| 发明名称 |
Oxide film, laminate and methods for their production |
| 摘要 |
<p>A method for forming an oxide film on a substrate by a sputtering process using a target comprising Zn as the main component, wherein sputtering is carried out in an in-line sputtering apparatus in an atmosphere which contains CO2 gas. <IMAGE></p> |
| 申请公布号 |
EP1178130(B1) |
申请公布日期 |
2005.08.17 |
| 申请号 |
EP20010119474 |
申请日期 |
1997.04.14 |
| 申请人 |
ASAHI GLASS COMPANY LTD. |
发明人 |
EBISAWA, JUNICHI;AOMINE, NOBUTAKA;HAYASHI, YASUO;TAKAKI, SATORU |
| 分类号 |
C03C17/22;C03C17/245;C03C17/34;C03C17/36;C23C14/00;C23C14/06;C23C14/08;C23C28/00;(IPC1-7):C23C14/08;C23C14/56 |
主分类号 |
C03C17/22 |
| 代理机构 |
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代理人 |
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| 主权项 |
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