| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method having very few processes, capable of processing only at room temperature, using a bit of chemicals and water, using only acid, and capable of easily recovering chemicals. SOLUTION: The cleaning method comprises a first process of cleaning with pure water containing ozone, a second process of cleaning with a cleaning solution containing HF, H<SB>2</SB>O<SB>2</SB>and/or O<SB>3</SB>, H<SB>2</SB>O and surfactant, while providing vibration in the frequency exceeding 500KHz, a third process of cleaning with the pure water, and a fourth process of removing an oxide film. COPYRIGHT: (C)2005,JPO&NCIPI
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