发明名称 Plasma processing system
摘要 A plasma processing apparatus M 1 is provided with a processing part 20 for supporting a pair of elongate electrodes 30 . The processing part 20 is provided with a plurality of pull bolts 52 (approach-deforming preventers) mutually spacedly arranged in the longitudinal direction of the electrode 30 . A head part of each pull bolt 52 is hooked on a rigid plate 33 through a bolt holder 53 , and a leg part thereof is screwed in the electrode 30 . Owing to this arrangement, the electrodes 30 can be prevented from being deformed by Coulomb's force.
申请公布号 US2005161317(A1) 申请公布日期 2005.07.28
申请号 US20040493899 申请日期 2004.04.27
申请人 发明人 MAYUMI SATOSHI;HINO MAMORU;YASHIRO SUSUMU;SHIMIZU HARUKAZU
分类号 H01J37/32;H05H1/24;H05H1/48;(IPC1-7):H05F3/00 主分类号 H01J37/32
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