| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method of removing a resist which can remove the resist with good production efficiency while preventing the resist from being retained certainly. SOLUTION: In the apparatus for removing the resist formed on a substrate by a chemical treatment and the method of removing the resist using the apparatus, an analyzing means for analyzing the composition of the chemical is provided in a chemical circulating route. The analyzing means includes preferably a measuring means of a resist ingredient concentration and/or a measuring means of a resist treatment agent concentration, and performs the control of the chemical treating condition in a real time according to output data transferred from the analyzing means. COPYRIGHT: (C)2005,JPO&NCIPI
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