发明名称 |
SUBSTRATE FOR PATTERNING AND CELL CULTURE SUBSTRATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a patterning substrate for cell culture where cells are allowed to adhere to the substrate in a high definition pattern and provide a cell culture substrate by allowing cells to adhere to the substrate in a high definition pattern. <P>SOLUTION: The substrate for patterning comprises the substrate material and the cell culture patterning layer that is formed on the substrate, at least has photocatalytic action and the cell adhesion-inhibitory action to inhibit the cell adhesion, further includes a cell adhesion inhibitor that decomposes or modifies the cells by the action of the photocatalyst activated by energy radiation. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005160441(A) |
申请公布日期 |
2005.06.23 |
申请号 |
JP20030406788 |
申请日期 |
2003.12.05 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
MIYAKE HIDEYUKI;HATTORI SHUJI;KOBAYASHI HIRONORI |
分类号 |
C12M3/00;A61L27/00;C12N5/00;C12N5/02 |
主分类号 |
C12M3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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