发明名称 SUBSTRATE FOR PATTERNING AND CELL CULTURE SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a patterning substrate for cell culture where cells are allowed to adhere to the substrate in a high definition pattern and provide a cell culture substrate by allowing cells to adhere to the substrate in a high definition pattern. <P>SOLUTION: The substrate for patterning comprises the substrate material and the cell culture patterning layer that is formed on the substrate, at least has photocatalytic action and the cell adhesion-inhibitory action to inhibit the cell adhesion, further includes a cell adhesion inhibitor that decomposes or modifies the cells by the action of the photocatalyst activated by energy radiation. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005160441(A) 申请公布日期 2005.06.23
申请号 JP20030406788 申请日期 2003.12.05
申请人 DAINIPPON PRINTING CO LTD 发明人 MIYAKE HIDEYUKI;HATTORI SHUJI;KOBAYASHI HIRONORI
分类号 C12M3/00;A61L27/00;C12N5/00;C12N5/02 主分类号 C12M3/00
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