发明名称 |
Method for fabricating microelectronic fabrication electrical test apparatus electrical probe tip having pointed tips |
摘要 |
A method for fabricating an electrical test apparatus electrical probe tip first provides a probe tip substrate having a topographic surface. A high density plasma chemical vapor deposition (HDP-CVD) deposited mandrel layer is then formed upon the topographic surface. It has a series of pointed tips formed over a series of topographic features within the topographic surface. Finally, a conductor probe tip layer is formed conformally upon the high density plasma chemical vapor deposition (HDP-CVD) deposited mandrel layer and replicating the series of pointed tips. Due to the series of pointed tips and the series of replicated pointed tips, a microelectronic fabrication when tested with the electrical test apparatus electrical probe tip is tested with enhanced accuracy.
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申请公布号 |
US6909300(B2) |
申请公布日期 |
2005.06.21 |
申请号 |
US20020143412 |
申请日期 |
2002.05.09 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD |
发明人 |
LU NAI-CHENG;LIAO YU-TING;LIU FU-SUNG |
分类号 |
G01R1/067;G01R3/00;(IPC1-7):G01R31/26 |
主分类号 |
G01R1/067 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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