| 发明名称 |
REMOVING SOLUTION |
| 摘要 |
The present invention provides a resist-removing solution for low-k film and a cleaning solution for via holes or capacitors, the solutions comprising hydrogen fluoride (HF) and at least one member selected from the group consisting of organic acids and organic solvents. The invention also provides a method of removing resist and a method of cleaning via holes or capacitors by the use of the solutions.
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| 申请公布号 |
EP1536291(A1) |
申请公布日期 |
2005.06.01 |
| 申请号 |
EP20030792757 |
申请日期 |
2003.08.21 |
| 申请人 |
DAIKIN INDUSTRIES, LTD. |
发明人 |
ITANO, MITSUSHI;KANEMURA, TAKASHI;NAKAMURA, SHINGO;KAMIYA, FUMIHIRO;KEZUKA, TAKEHIKO |
| 分类号 |
C11D7/24;C11D7/08;C11D7/26;C11D7/28;C11D7/32;C11D7/34;C11D11/00;G03F7/42;H01L21/02;H01L21/306;H01L21/311;H01L21/768;H05K3/26;(IPC1-7):G03F7/42;H01L21/027;H01L21/304 |
主分类号 |
C11D7/24 |
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