| 摘要 |
Aqueous dispersion containing silicon dioxide powder, which is stable in a pH range of 2 to 6, which contains a cation-providing compound that is at least partially soluble in this pH range and the zeta potential of which is less than or equal to zero. It is produced by bringing silicon dioxide powder and at least one cation- providing compound into contact whilst moving in an aqueous medium. The dispersion can be used for chemical-mechanical polishing of metal surfaces.
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