发明名称 Semiconductor component with field stop layer with p or n channel transistor has transistor gate arranged so potential exists between gate, bounding part of spatial charging zone area to cause a current to flow through field stop layer
摘要 <p>The device (1A) has a spatial charging zone area (5) and a field stop layer (4) with at least part of a p or n channel transistor for limiting a spatial charging zone that can be formed in the spatial charging zone area. The transistor's gate (14,19) is in direct contact with the spatial charging zone area. It is arranged so that a large enough potential exists between the gate and the bounding part of the spatial charging zone area to switch the p or n channel (15,16) of the transistor to cause a current to flow via the channel through the field stop layer.</p>
申请公布号 DE10334797(B3) 申请公布日期 2005.05.25
申请号 DE2003134797 申请日期 2003.07.30
申请人 INFINEON TECHNOLOGIES AG 发明人 PFIRSCH, FRANK
分类号 H01L29/06;H01L29/08;H01L29/40;H01L29/739;(IPC1-7):H01L29/70 主分类号 H01L29/06
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