| 摘要 |
Lithography apparatus comprises a lithography tool housed in a first chamber, and a source of radiation at or below ultra violet wavelengths housed in a second chamber connected to the first chamber to enable radiation generated by the source to be supplied to the tool. A cryogenic vacuum pump is provided for at least one, preferably for each, of the chambers. A target material, such as xenon, supplied to the source for the generation of radiation is pumped from the second chamber, cryogenically purified and re-supplied to the source. A cryogenic refrigerator supplies cryogen to the cryogenic purifier and to the cryogenic vacuum pump(s). |
