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发明名称	PLASMA ETCH REACTOR AND METHOD
摘要
申请公布号	KR100453538(B1)	申请公布日期	2005.05.17
申请号	KR19980710862	申请日期	1998.12.30
申请人		发明人
分类号	H01L21/302;(IPC1-7):H01L21/302	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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