System and method for supplying photoresist

摘要

A photoresist supply system includes a storage bottle and a reservoir coupled in flow communication therewith. A vacuum pump is coupled in flow communication with the reservoir and creates a vacuum within the reservoir that draws photoresist out of the storage bottle and into the reservoir. An inlet into the reservoir is configured to flow photoresist down an inner wall of the reservoir. The photoresist flows out of the reservoir into a dispense reservoir from which the photoresist is pumped to a dispense nozzle for application to a wafer or substrate.