发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus which is easy in maintenance owing to the adoption of a drawing structure. SOLUTION: A unit base 47 is supported forward/backward movably by a slider 49 in relation to a frame 51. The unit base 47 is made to communicate/be connected with the frame 51 by a freely expandable/contractable exhaust duct 67, process liquid piping, and drain piping. Since the unit base 47 can freely be drawn from the frame 51, the maintenance is easy. Moreover, since the unit base 47 is connected with the frame 51 to be able to function, the unit base 47 can be actuated as usual even when the unit base 47 is drawn out. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005087944(A) 申请公布日期 2005.04.07
申请号 JP20030327605 申请日期 2003.09.19
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YOSHII HIROYUKI;TAKAHASHI YASUO
分类号 G03F7/30;B05C11/08;H01L21/027;(IPC1-7):B05C11/08 主分类号 G03F7/30
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