| 发明名称 |
A FLUOROMETRIC METHOD FOR INCREASING THE EFFICIENCY OF THE RINSING AND WATER RECOVERY PROCESS IN THE MANUFACTURE OF SEMICONDUCTOR CHIPS |
| 摘要 |
<p>A method for determining wafer cleanliness by fluorometric monitoring of the impurities in the semiconductor chip wafer rinse solution. A clean chip is indicated by a leveling off of increased concentration of impurities as the rinsing of the chip progresses. A method for optimizing reuse or recyling of the water discharged from the rinse process which accurately measures the contaminants in that water.</p> |
| 申请公布号 |
EP1016127(B1) |
申请公布日期 |
2005.04.06 |
| 申请号 |
EP19980946942 |
申请日期 |
1998.09.10 |
| 申请人 |
NALCO CHEMICAL COMPANY |
发明人 |
JENKINS, BRIAN, V.;HOOTS, JOHN, E. |
| 分类号 |
H01L21/304;H01L21/306;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/304 |
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