| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion implanting device with previous problems of a large size, large power output, variability of energy or the like solved. SOLUTION: The ion implanting device 10 equipped with an ion source and an ion accelerating device accelerating ion from the ion source up to required energy is so structured to use an ECR ion source 20 as the ion source, and an IH type linear accelerator 30 as the ion accelerating device. In this case, the ion implanting device can be made more compact and power-saving, if the IH type linear accelerator 30 is made provided with an APF convergence function, and supplementarily, a quadrupole convergence function. COPYRIGHT: (C)2005,JPO&NCIPI
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