| 摘要 |
PROBLEM TO BE SOLVED: To provide the initialization method of a cleaning member, wherein the initialization of the cleaning member formed by nonwoven fabric can be performed in substrate cleaning equipment which performs cleaning of a polished substrate. SOLUTION: The cleaning member 21 whose rear surface side is formed of cleaned nonwoven fabric which performs cleaning is brought into contact with the surface 1a of a substrate 1 for initialization, while supplying liquid for initialization, and scrub is performed so that sufficient initialization of the cleaning member can be performed. In substrate-cleaning equipment equipped with the cleaning member initialized by the initialization method, a substrate can be cleaned with sufficient cleanliness factor. Further, in a substrate-polishing and cleaning system equipped with the substrate-cleaning equipment, after planarizing and planishing of the substrate is performed, the substrate can be cleaned with sufficient cleanliness factor. COPYRIGHT: (C)2005,JPO&NCIPI
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