| 摘要 |
PURPOSE: An exhaust pressure controlling apparatus of wafer bake equipment and method thereof are provided to keep exhaust pressure constant in a bake unit block by using a pressure sensor and an exhaust pressure controller. CONSTITUTION: An exhaust pressure controlling apparatus includes first exhaust lines, a second exhaust line, a damper, a pressure sensor, an exhaust pressure controller, and a main controller. The first exhaust lines(120,130) are used for removing exhaust gas from each bake unit of a bake unit block. The second exhaust line(140) is connected with the first exhaust lines to flow the exhaust gas to the outside. The damper(150) for controlling pressure of the bake unit block is installed on the second exhaust line. The pressure sensor(180) for measuring pressure of each first exhaust line is connected with the first exhaust lines. The exhaust pressure controller(160,170) is used for controlling automatically pressure of the first exhaust line. The main controller(190) is capable of controlling automatically the pressure of the bake unit block according to the result of the pressure sensor.
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