METHOD AND APPARATUS FOR EXPOSURE SIMPLIFYING EXPOSURE PROCESS USING UNIT MASK IN FABRICATING OF LARGE SCALE MASK ASSEMBLY

摘要

PURPOSE: A method and an apparatus for an exposure are provided to simplify an exposure process and to prevent the distortion of a pattern image by using a unit mask in the fabrication of a large scale mask assembly. CONSTITUTION: An apparatus for an exposure includes a unit mask and a support frame. A plurality of masks(20) is formed with interlocking each other in a plane state. A plurality of unit masks is connected and supported each other by a support frame(40). The support frame is provided with a connecting frame, the connecting frame connects a unit mask with a plurality of unit masks interlocking each other.