发明名称 SEMICONDUCTOR OPTICAL ELEMENT AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor optical element wherein light extraction efficiency or optical absorption efficiency is improved. <P>SOLUTION: A lower surface 7 of an N-type GaN layer 5 which is exfoliated from a substrate 1 is constituted of voids 6 and an exfoliated surface 3b which is formed by exfoliating a part of a GaN layer 2 which constitutes convex parts 3 from the substrate 1. Since the lower surface 7 is an un-flat surface which is constituted of the exfoliated surface 3b which is made into an almost flat surface and the voids 6 which have a recessed shape to the exfoliated surface 3b, total reflection of light generated from an InGaN layer 8 which is made into a light emitting layer is hardly carried out by the lower surface 7, and light extraction efficiency of the element can be improved. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005057220(A) 申请公布日期 2005.03.03
申请号 JP20030289340 申请日期 2003.08.07
申请人 SONY CORP 发明人 BIWA TSUYOSHI
分类号 H01L21/205;H01L33/12;H01L33/24;H01L33/32;H01L33/62 主分类号 H01L21/205
代理机构 代理人
主权项
地址