发明名称 Method and apparatus for detecting wafer flaw
摘要 The present invention provides an apparatus for detecting flaws in a wafer. The apparatus has a detection platform for holding a wafer positioned thereon, a cross-bar ultrasonic detection device positioned above the detection platform for emitting and receiving an ultrasonic wave reflected by a wafer; and a microprocessor for processing the reflected ultrasonic and transmits to a monitor.
申请公布号 US2005028594(A1) 申请公布日期 2005.02.10
申请号 US20030633414 申请日期 2003.08.04
申请人 CHEN CHIH-KUN;KUNG YAO-HSIUNG;LO TUN YUAN 发明人 CHEN CHIH-KUN;KUNG YAO-HSIUNG;LO TUN YUAN
分类号 G01N29/07;G01N29/22;G01N29/44;(IPC1-7):G01N29/04 主分类号 G01N29/07
代理机构 代理人
主权项
地址
您可能感兴趣的专利