发明名称 FILM FORMING DEVICE, FILM FORMING METHOD, ORGANIC EL ELEMENT, AND METHOD FOR MANUFACTURING THE ELEMENT
摘要 PROBLEM TO BE SOLVED: To enable film forming to obtain excellent pattern forming precision or uniformity of film thickness in conducting the film forming for a substrate having a relative large area. SOLUTION: A substrate 1 on which the film forming is conducted is provided with a linear arrangement film forming source 20 having at least a plurality of film forming cells 20a arranged in a straight line, and the film forming is conducted on the substrate while moving either or both of the source 20 and the substrate 1 in a direction (an arrow direction) intersecting the direction of the arrangement. In the source 20, the cells 20a are arranged so that a moving track pitch p<SB>m</SB>of each cell 20a become narrow to an arrangement pitch p between cells 20a adjacent along the direction of the arrangement in the straight line. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005032464(A) 申请公布日期 2005.02.03
申请号 JP20030193268 申请日期 2003.07.08
申请人 TOHOKU PIONEER CORP 发明人 TAN HIROKI;UMETSU SHIGEHIRO
分类号 H05B33/10;C23C14/12;C23C14/24;H01L51/50;H05B33/12;H05B33/14;(IPC1-7):H05B33/10 主分类号 H05B33/10
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