| 发明名称 |
PHOTOLITHOGRAPHY MASK COMPRISING ABSORBER/PHASE-SHIFTER ELEMENTS |
| 摘要 |
This invention relates to an insolation mask including a transparent substrate ( 100 ) and at least one absorber/phase shifter element ( 112 ) embedded in the substrate, so as to form a monolithic assembly with the substrate. Application to photolithography. |
| 申请公布号 |
EP1502153(A2) |
申请公布日期 |
2005.02.02 |
| 申请号 |
EP20030749925 |
申请日期 |
2003.05.06 |
| 申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
THONY, PHILIPPE;ASPAR, BERNARD;FANGET, GILLES |
| 分类号 |
G03F1/00;H01L21/027 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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| 地址 |
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