ION BEAM IRRADIATION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an ion beam irradiation device which is equipped with an electron source that can generate large amount of electrons of low energy by a drawing voltage lower than the conventional technology as an electron source for charge suppression of the treatment body. SOLUTION: This ion beam irradiation device comprises a field emission type electron source 10 which is arranged at the side of a passage of an ion beam 2 on the upstream side of a holder 6 and emits electrons 22 into the passage of the ion beam 2 and a drawing-out power supply 30 for it. This field emission electron source 10 has a large number of minute emitters having a tip with sharpened profile formed on the conductive substrate 12 and a gate electrode 18 surrounding the vicinity of the tip of each emitter 14 with a minute gap, and an insulating layer for insulating between the gate electrode 18 and the substrate 12. COPYRIGHT: (C)2005,JPO&NCIPI