发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substrate by the patterned beam.
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申请公布号 |
US2005018997(A1) |
申请公布日期 |
2005.01.27 |
申请号 |
US20040868380 |
申请日期 |
2004.06.16 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BLEEKER ARNO JAN |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G02B6/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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