| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of stably making the illuminance distribution onto a substrate a desired one (for example, a uniform distribution) and performing a highly precise exposure while keeping the defocus distortion minimum even if the numerical aperture of an optical system is large or the exposure conditions such as the illuminating mode change in various way. SOLUTION: The exposure apparatus has an illumination optical system for illuminating an original with light from a light source, a projection optical system for projecting the original pattern onto a substrate, and a variable stop arranged in the vicinity of a position conjugate with the substrate and having an aperture for defining the illumination area of the substrate, and the variable stop is variable in the direction along the optical axis of the illumination optical system or the projection optical system. COPYRIGHT: (C)2005,JPO&NCIPI
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