发明名称 |
Film-forming device with a substrate rotating mechanism |
摘要 |
A film-forming device with a substrate rotating mechanism includes a susceptor 30 in the form of a circular disk; a base plate 6 positioned below the susceptor 30 and rotatably retaining the susceptor 30; a revolution generating section 5 rotating the susceptor 30 at the outer periphery of the susceptor 30; a plurality of substrate tray retaining sections 23 arranged on the susceptor 30; a plurality of annular substrate trays 20 rotatably supported in the corresponding substrate tray retaining sections 23; a rotation generating section 4 rotating the substrate trays 20; and a plurality of substrates W retained in the substrate trays 20. The substrates W are revolved by the rotation of the susceptor 30 and rotated by the rotation of the substrate trays 20 to apply a certain film-forming process. The substrates W are rotated and revolved by one or more revolution generating section 5 and the rotation generating section 4.
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申请公布号 |
US6837940(B2) |
申请公布日期 |
2005.01.04 |
申请号 |
US20010002177 |
申请日期 |
2001.12.05 |
申请人 |
E.E. TECHNOLOGIES INC. |
发明人 |
KOMENO JUNJI;SHIINA KAZUSHIGE |
分类号 |
C23C16/44;C23C16/458;C30B25/12;H01L21/205;H01L21/28;H01L21/285;H01L21/302;H01L21/3065;H01L21/687;(IPC1-7):H01L21/205;C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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