发明名称 |
ANTI-POLLUTION EQUIPMENT, ANTI-POLLUTION METHOD, AND ANTI-POLLUTION PROGRAM |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To on/off-control an anti-pollution equipment without affecting facilities on the semiconductor manufacturing apparatus side. <P>SOLUTION: A pressure gage 7 for monitoring the pressure in a pipe 4 is installed in the pipe 4 between a plasma type abatement system 5 and a turbopump 3. A controller 8 actuates the plasma type anti-pollution equipment 5 when the pressure measured by the pressure gage 7 is in a specified range, and stops the plasma type abatement system 5 when the pressure measured by the pressure gate 7 is out of the specified range. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2004342921(A) |
申请公布日期 |
2004.12.02 |
申请号 |
JP20030139198 |
申请日期 |
2003.05.16 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SUGIURA TOSHIKAZU |
分类号 |
B01D53/34;B01J19/08;H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
B01D53/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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