| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a plasma display panel wherein a structure such as an address electrode of the PDP is formed by a photolithography method, the generation of a defect such as a chip due to dust or the like adhered to a photomask is suppressed, and upward warping, peeling or the like are also prohibited. SOLUTION: Light exposure to a pattern of the structure forming such as the address electrode is performed by first exposure which carries out pattern exposure at its approximately central region and by second exposure which carries out pattern exposure overlapping at a part of the first exposure region and at a remained part of the pattern of the structure, by which the disconnection of the pattern due to the dust adhered to the photomasks 22, 24 and the generation of a defective configuration caused by two times of exposure are suppressed. COPYRIGHT: (C)2005,JPO&NCIPI
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