| 摘要 |
PROBLEM TO BE SOLVED: To control the film thickness so as to be locally increased when manufacturing a film on a film deposition surface of a substrate 4 by the plasma CVD method. SOLUTION: A film 6 is manufactured on a film deposition surface 4a of a substrate 4 by the plasma CVD method. By locally generating the magnetic field A on the film deposition surface 4a of the substrate 4, the ratio of the maximum thickness of the film 6 to the minimum thickness thereof is set to be≥2. Preferably, a magnet 5 is locally installed on a back surface 4b side of the substrate 4. COPYRIGHT: (C)2005,JPO&NCIPI
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