发明名称 MANUFACTURING METHOD OF SUBSTRATE HAVING RECESSED SECTIONS FOR MICROLENS, SUBSTRATE HAVING RECESSED SECTION FOR MICROLENS, MICROLENS SUBSTRATE, TRANSMISSIVE TYPE SCREEN AND REAR TYPE PROJECTOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a microlens substrate having a suitable visual field angle distribution, a substrate having recessed sections for microlenses which is suitable for manufacturing a microlens substrate, a manufacturing method of the substrate having recessed sections for microlenses and a transmissive type screen and a rear type projector having the microlens substrate. <P>SOLUTION: A plurality of microlenses is formed along the surface direction of the microlens substrate and the microlenses form an elliptical shape when they are flatly observed. The length of the short axis of the microlens is 10 to 500&mu;m and the length of the long axis is 10 to 1500&mu;m. Let La[&mu;m] be the length of the short axis direction of the microlens and Lb[&mu;m] be the length of the long axis direction of the microlens. Then, the microlens satisfies the following relationship, i.e., 1<Lb/La&le;3. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004340985(A) 申请公布日期 2004.12.02
申请号 JP20030133738 申请日期 2003.05.12
申请人 SEIKO EPSON CORP 发明人 SHIMIZU NOBUO
分类号 G03B21/62;G02B3/00;G02F1/13;G02F1/1333;G02F1/1335 主分类号 G03B21/62
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